T. Yamazaki, Y. Koizumi, K. Yuge, A. Chiba, K. Hagihara. T. Nakano, K. Kishida, H. Inui
Mechanisms of lamellar structure formation and Cr interfacial segregation in C11_b-MoSi₂/C40-NbSi₂ dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
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doi:10.1016/j.commatsci.2015.04.018